Global Sources
EE Times-India
Stay in touch with EE Times India
 
 
Manufacturing/Packaging  

Visible light nanoscaling enhances photolithography

Posted: 11 Feb 2011  Print Version  Bookmark and Share

Keywords:multi-photon photoresists  Resolution Augmentation through Photo-Induced Deactivation  nanoscale resolution 

University of Maryland research team says that the use of multi-photon photoresists enabling visible light to achieve nanoscale resolution that is inversely dependent on exposure time will help take forward photolithography research on extremely short wavelengths of UV light.

"Most approaches to getting higher resolution with photolithography involve using light of ever shorter wavelengths," said professor John Fourkas. "Our goal is to use visible light to produce nanoscale features."

The new multi-photon technique, called Resolution Augmentation through Photo-Induced Deactivation (RAPID), uses one laser to initiate exposure in the photoresist and a second to complete it, allowing full exposure of only the nanoscale overlapping areas of the two focused beams.

"If we take a laser beam and focus it through a microscope objective, we can confine absorption to this very tiny region right at the focal volume of the laser," Fourkas said.

The researchers have already perfected the technique for use in the selective polymerisation of 3D materials on-chip. Using what is called Multi-photon Absorption Polymerisation (MAP), the team has fabricated tiny inductors on chips. RAPID is a follow-on effort to use multi-photon absorption with photoresists to achieve nanoscale resolution with focused visible light, delaying or possibly eliminating the need to move to extreme UV (EUV) light sources.

The technique works at normal atmospheric pressure, unlike EUV, which requires processing in a vacuum. Instead, a special photo-initiator in the resist is activated by one laser, then deactivated by a second, realising a phenomenon the researchers call proportional velocity (PROVE), which yields smaller features for higher exposures.

Next the researchers plan to test their technique on the wafer scale, in contrast to the point-by-point demonstrations they have given so far. The team estimates that RAPID will be ready for commercialisation in about 10 years.

 multi-photon photoresists

Figure 1: Microinductor created using multi-photon absorption polymerisation (MAP) followed by selective metallisation.

R. Colin Johnson
EE Times





Comment on "Visible light nanoscaling enhances p..."
Comments:  
*  You can enter [0] more charecters.
*Verify code:
 
 
 
Webinars

Seminars

Visit Asia Webinars to learn about the latest in technology and get practical design tips.

 

Go to top             Connect on Facebook      Follow us on Twitter      Follow us on Orkut

 
Back to Top