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| 2012-01-31 | Laser ablation systems get larger sample cells Resonetics' RESOlution line of deep ultraviolet 193nm laser ablation systems for LA-ICP-MS now offers the S-155 two-volume sample cell with a 155mm x 105mm working area. |
| 2010-06-04 | Industry favours 193nm immersion, EUV litho in survey Industry favours 193nm immersion, EUV litho in survey |
| 2010-03-23 | Analyst: ASML, Nikon to share 22nm litho biz At 22nm, Intel will continue to use 193nm immersion lithography from two suppliers as per Arete Research analyst Jagadish Iyer. |
| 2010-02-25 | Intel delays EUV litho Intel Corp.'s yet again delays it extreme ultraviolet (EUV) plans in favour of extending its 193nm immersion to the 11nm logic node. |
| 2010-02-15 | Report: Samsung monopolises ASML litho supply Samsung is monopolizing ASML Holding NV's supply chain by procuring a slew of 193nm scanners . |
| 2010-01-08 | Is TSMC switching to Nikon? In a surprise move, TSMC has procured a new 193nm immersion lithography scanner from rival Nikon Corp., according to sources. |
| 2009-06-23 | Intel takes 193nm litho to 15nm Intel takes 193nm litho to 15nm |
| 2009-04-28 | Photoresist market gets boost from litho tools The trend towards advanced 193nm DUV lithography tools is affecting the market shares of photoresist suppliers. |
| 2009-03-03 | TSMC reveals litho roadmap at SPIE conference TSMC has disclosed its lithography roadmap at the SPIE Advanced Lithography conference, saying it is still backing maskless technology. |
| 2007-10-08 | Toshiba explores 450mm fab, EUV litho tech Apart from exploring several new chip-production tech, Toshiba is also in talks with lithography partner Nikon and ASML Holding NV about the EUV technology. |
| 2007-04-16 | Litho woes pulling down semicon industry The lithography world has suddenly turned upside-down as the industry gets socked by a double whammy: The window of opportunity is slowly closing on EUV lithography for IC production, but the most likely alternative—a version of 193nm immersion—is proving expensive. |
| 2007-02-27 | IBM extends immersion lithography to 22nm IBM outlined last week its lithography roadmap, saying that it would extend 193nm immersion lithography down to the 22nm node for logic production. the company's plans for extreme ultraviolet (EUV) lithography could get pushed out again, as the technology is not expected to be ready for the early development work at the 22nm node for logic, according to IBM's lithography guru. |
| 2006-12-14 | ASML bags 45nm lithography deal IBM Corp. and Advanced Micro Devices Inc. (AMD) presented papers describing the use of immersion lithography, ultra-low-k dielectrics, and multiple enhanced transistor strain techniques for 45nm microprocessor designs at the International Electron Devices Meeting. |
| 2006-08-10 | Lithography research stalls at 32nm While immersion lithography has given the chip industry a short reprieve to scale to Moore's Law, lithographers are counting on either extreme ultraviolet or 193nm immersion scanners with higher-index fluids for the 32nm half-pitch. |
| 2006-02-22 | IBM breaks 193nm lithography record IBM breaks 193nm lithography record |
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