What is Extreme Ultra-Violet radiation (EUV)?
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Extreme Ultra-Violet (EUV) radiation is generally considered to be the part of the electromagnetic spectrum spanning from 120nm down to 10nm. Its main uses are photoelectron spectroscopy, solar imaging and lithography. Extreme ultraviolet lithography (EUVL) is a next-generation lithography technology using the 13.5nm EUV wavelength. |
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| 2012-03-12 | PDK available for 14nm logic chips Imec's early-version PDK for 14nm logic chips targets the introduction of a number of new key technologies, such as FinFET technology and EUV lithography. |
| 2011-01-13 | Nissan Chemical, Sematech join forces on EUV research Nissan Chemical, Sematech join forces on EUV research |
| 2010-09-23 | Opinion: e-beam critical to semiconductor manufacturing D2S Inc. CEO Aki Fujimura discusses the role of electron beam lithography in the future of semiconductor manufacturing and is of the opinion that all leading-edge designs will require e-beam technology. |
| 2010-06-28 | Stanford dean provides CMOS, education outlook James Plummer, dean of Stanford's school of engineering talks about the outlook for CMOS, engineering, education and globalisation. |
| 2010-06-14 | EUV litho for 22nm unlikely to take-off EUV litho for 22nm unlikely to take-off |
| 2010-06-04 | Industry favours 193nm immersion, EUV litho in survey Industry favours 193nm immersion, EUV litho in survey |
| 2010-04-28 | EUV light source achieves breakthrough output EUV light source achieves breakthrough output |
| 2010-04-15 | TSMC moves from 28nm to 20nm half-node Taiwan Semiconductor Manufacturing Co. Ltd will give the 22nm "full node" a miss by moving on directly to the 20nm "half node" from the 28nm node. |
| 2010-04-08 | EUV hits another hurdle in inspection tools EUV hits another hurdle in inspection tools |
| 2010-03-25 | Was EUV the wrong bet for the industry Was EUV the wrong bet for the industry |
| 2010-03-18 | Canon keeps mum on litho nanoimprint An analyst believes that Canon's 'great white hope' in lithography rests with an undisclosed relationship with nanoimprint lithography vendor Molecular Imprints Inc. |
| 2010-03-12 | E-beam direct-write litho to be here only by 2015 Even with multiple development efforts on e-beam direct-write lithography underway, one prominent lithography researcher warns that production tools are still a minimum of five years away. |
| 2010-03-03 | Delays, double-patterning dominates SPIE Litho The themes of this year's SPIE Advanced Lithography event were clear: D and D—delays and double-patterning. Indeed, EUV is delayed. So is maskless. And nanoimprint is still stuck in R&D. |
| 2010-03-02 | Nikon outlines litho plan Nikon outlined its lithography roadmap that includes a revised roadmap for extreme ultraviolet (EUV) lithography. |
| 2010-03-02 | TSMC addresses issues At the TSMC Japan Executive Forum in Yokohama, Shang-Yi Chiang, senior VP of R&D at TSMC, addressed several issues such as 40nm yields, high-k, litho issues about the silicon foundry giant. |
| 2010-03-01 | EUV delay makes alternatives a reality EUV delay makes alternatives a reality |
| 2010-02-25 | Intel delays EUV litho Intel delays EUV litho |
| 2010-02-24 | Samsung wants EUV litho by 2012 Samsung wants EUV litho by 2012 |
| 2010-01-28 | 450mm, EUV delays to slow down Moore's Law 450mm, EUV delays to slow down Moore's Law |
| 2010-01-25 | Analysts see further delay in 450mm, EUV, TSVs Analysts see further delay in 450mm, EUV, TSVs |
| 2010-01-05 | What to sort out in electronics in 2010 EE Times editors list nettlesome issues they'd most like to see electronics engineers fix next year ranging from grand challenges of engineering to niggling nettles of consumer gadgetry. |
| 2009-11-30 | Sematech seeks collaboration, looks into fabless Sematech is exploring options to attract fabless companies into the fold and is hoping to expand its collaborative efforts with fab tool makers, |
| 2009-11-19 | EUV photoresist developed for 20nm EUV photoresist developed for 20nm |
| 2009-10-12 | ASML pushes EUV litho for 2012 ASML pushes EUV litho for 2012 |
| 2009-09-24 | Intel CEO: More SoCs than CPUs coming soon Intel will someday ship more SoC devices than PC processors, according to CEO Paul Otellini's keynote at the Intel Developer Forum. |
| 2009-08-11 | GlobalFoundries beats TSMC on tech, analyst says GlobalFoundries (GF) might be not a leader in terms of volume, but in any case, it is a leader in terms of technology, according to Gartner analyst Bob Johnson. |
| 2009-06-23 | Intel takes 193nm litho to 15nm Intel claims that it has pushed 193nm immersion lithography down to 15nm—at least in the lab. |
| 2009-05-20 | Nikon dismisses report on EUV delay Nikon dismisses report on EUV delay |
| 2009-05-19 | Nikon puts EUV litho on hold Nikon puts EUV litho on hold |
| 2009-04-27 | 22-nm SRAM cells made with EUV litho 22-nm SRAM cells made with EUV litho |
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