What is Extreme Ultra-Violet radiation (EUV)?
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Extreme Ultra-Violet (EUV) radiation is generally considered to be the part of the electromagnetic spectrum spanning from 120nm down to 10nm. Its main uses are photoelectron spectroscopy, solar imaging and lithography. Extreme ultraviolet lithography (EUVL) is a next-generation lithography technology using the 13.5nm EUV wavelength. |
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| 2008-10-22 | EUV lithography most likely for 22-nm node EUVL is the most likely way the industry will make ICs with minimum geometries of 22-nm and finer. |
| 2008-01-23 | IMEC, CNSE collaborate to boost EUVL IMEC, CNSE collaborate to boost EUVL |
| 2006-08-10 | Lithography research stalls at 32nm While immersion lithography has given the chip industry a short reprieve to scale to Moore's Law, lithographers are counting on either extreme ultraviolet or 193nm immersion scanners with higher-index fluids for the 32nm half-pitch. |
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