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| 2012-04-20 | Renesas taps Synopsys' litho verification sol'n Renesas adopts Synopsys' Proteus LRC as a comprehensive lithographic verification solution offering high accuracy and low cost of ownership. |
| 2011-08-29 | Data acquisition platform supports OPC-HDA Data acquisition platform supports OPC-HDA |
| 2008-05-14 | Gauda picks SoftJin's Nirmaan for OPC acceleration tool Gauda picks SoftJin's Nirmaan for OPC acceleration tool |
| 2007-11-27 | Synopsys PCX tech reduces TSMC's design-to-mask cycle-time TSMC has successfully implemented Synopsys' new PCX technology that reduces data communication overhead and turnaround time between Synopsys' Proteus OPC and CATS MDP software. |
| 2007-04-20 | Synopsys, NGR to enable more accurate OPC model-building Synopsys, NGR to enable more accurate OPC model-building |
| 2007-03-14 | KLA-Tencor litho optimisation solution suits 32nm designs KLA-Tencor has introduced the latest version of its PROLITH lithography optimisation product—the PROLITH 10—which enables users to accurately predict lithography process windows for IC designs down to 32nm. |
| 2006-12-12 | Design complexity drives EDA tool functionality During the next three years, the areas that are expected to drive growth for the EDA market are high level functional verification, ESL, DFM, RET, OPC and automotive electronics. |
| 2006-12-05 | Cell BE platform accelerates optical proximity correction Mentor Graphics Corp. and Mercury Computer Systems are bringing out what they say is the first Cell Broadband Engine (BE)-based acceleration platform for the EDA market. |
| 2006-10-04 | Yogitech announces OCP verification component Yogitech SPA, a provider of design and verification technology, announced what it touts as the industry's first mixed-language Open Core Protocol UVC. |
| 2006-09-22 | Synopsys, Nikon to develop 45nm solutions Synopsys Inc. and Nikon Corp. have joined forces to develop and deliver advanced lithography software models and DFM-enabled lithography manufacturing solutions for 45nm and below. |
| 2006-09-18 | OPC tool promising 3-D imaging effects OPC tool promising 3-D imaging effects |
| 2005-12-01 | Manufacturing moves into IC design flow Clear Shape is preparing a technology that will bring 'design manufacturability check' models into the IC design flow, along w.ith tools to help optimize designs so they won't have problems with optical proximity correction (OPC) or manufacturing. |
| 2001-03-01 | Library generators employ optical correction at cell level This technology article discusses the enhancement of cell-based designs with the evolution of EDA. |
| 2001-05-16 | Practical IC design in the sub-wavelength regime Demonstrated success of sub-wavelength lithographic processes has created the demand for a more robust, comprehensive design flow. |
| 2002-10-16 | Scalable DP, OPC bridge subwavelength distortions Scalable DP, OPC bridge subwavelength distortions |
| 2005-05-16 | Across the flow: DFM's many faces EDA toolmakers, designers forge partnership to develop new DFM process flow |
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