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| 2009-06-05 | Synopsys CEO: Crisis presents opportunities The IC industry is headed for increasing challenges from higher design costs and production at smaller geometries. |
| 2008-08-01 | Moving beyond advanced design geometries Moving beyond advanced design geometries |
| 2007-08-14 | Boost productivity with ESL techniques The increased complexity that comes with 90nm and smaller geometries have led to a myriad of severe challenges, including HW/SW co-design, power management and verification. An ESL methodology offers a viable solution to these challenges. |
| 2007-01-08 | Magma, UMC complete 65nm library suite Magma Design Automation announced that United Microelectronics Corp. (UMC) has characterised its internally developed libraries for 65nm and smaller process geometries using Magma's SiliconSmart. |
| 2005-09-22 | No scapegoats found for failed chip designs Asked who shoulders the blame when nanometer IC designs don't work, panelists at the Custom Integrated Circuits Conference (CICC) here Tuesday evening (Sept. 20) agreed that designers, foundries, and EDA vendors all share the responsibility for ensuring success at advanced process geometries. |
| 2001-02-01 | Testing dimensional limits of high I/O flip-chip design Testing dimensional limits of high I/O flip-chip design |
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