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| 2012-01-20 | How to employ critical area analysis Critical area analysis is a DFM technique that measures the susceptibility of a specific layout to random defects and indicates areas of the layout where design modifications can have the greatest positive impact on overall yield. |
| 2010-06-04 | Layout-aware DFT improves yield Layout-aware DFT improves yield |
| 2007-03-23 | Conquer loss, create high-yielding designs This article discusses the three most important yield-loss mechanisms in 65nm designs, and proposed methods for mitigating yield loss without severe impact on design schedules. Using tools that are both powerful and well-integrated, design and layout engineers can create high-yielding designs while meeting design specifications and demanding schedules. |
| 2006-01-24 | Partnership results in DFM sign-off tool Nannor Technologies Inc. and Predictions Software announced the integration of the Acuma chip level layout optimisation tool and the EYES yield analysis software. |
| 2005-05-16 | Across the flow: DFM's many faces EDA toolmakers, designers forge partnership to develop new DFM process flow |
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