| Researchers claim cheaper technique to 65nm node
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2007-04-03 |
| Researchers at the Georgia Institute of Technology and Focal Point Microsystems announced 3D multi-photon lithography, a technique that claims to enable a cheaper, easier way to pattern at the 65nm node |
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| Toshiba explores 450mm fab, EUV litho tech
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2007-10-08 |
| Apart from exploring several new chip-production tech, Toshiba is also in talks with lithography partner Nikon and ASML Holding NV about the EUV technology |
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| Opinion: e-beam critical to semiconductor manufacturing
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2010-09-23 |
| D2S Inc. CEO Aki Fujimura discusses the role of electron beam lithography in the future of semiconductor manufacturing and is of the opinion that all leading-edge designs will require e-beam technology |
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| TSMC joins CEA-Leti's IMAGINE programme
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2009-07-08 |
| Taiwan Semiconductor Manufacturing Co. and French semiconductor research institute CEA-Leti signed an agreement for TSMC to join a programme assessing maskless lithography for IC manufacturing |
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| Synopsys, Nikon to develop 45nm solutions
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2006-09-22 |
| Synopsys Inc. and Nikon Corp. have joined forces to develop and deliver advanced lithography software models and DFM-enabled lithography manufacturing solutions for 45nm and below |
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| Experts express doubts about next-gen litho
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2009-03-02 |
| Next-generation lithography (NGL) technologies like EUV, maskless nanoimprint and advanced double-patterning continue to face a lot of difficulties, according to a panel at the SPIE Advanced Lithography conference |
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| Nikon dismisses report on EUV delay
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2009-05-20 |
| Responding to an analyst, Nikon says that its EUV lithography programme is still alive and well |
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| Vienna to host nano-imprint litho seminar
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2005-09-12 |
| Photomask vendor Photronics has said it will host a seminar on nano-imprint lithography during the Micro- and Nanoengineering Conference in Vienna, Austria, on Sept. 21 |
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| Soaring prices hinder Canon's litho dreams
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2009-09-23 |
| The end could be near for Canon Inc.'s lithography efforts, as the company is reportedly mulling plans to cease future, high-end scanner development, according to sources |
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| Is TSMC switching to Nikon?
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2010-01-08 |
| In a surprise move, TSMC has procured a new 193nm immersion lithography scanner from rival Nikon Corp., according to sources |
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| Nissan Chemical, Sematech join forces on EUV research
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2011-01-13 |
| Nissan Chemical and Sematech have joined forces to cooperate on advanced adhesion enhancing materials in extreme UV lithography for 22nm chips |
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| EUV light source achieves breakthrough output
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2010-04-28 |
| Japan's Extreme Ultraviolet Lithography System Development Association (EUVA) claims to have achieved the highest output for EUV light source at 104W |
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| EVG, IME partner on TSV process for 3D IC
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2010-07-13 |
| This joint development is set to enhance IME's 3D IC research and development capabilities in wafer bonding, lithography and chip stacking for 200-mm and 300-mm through-silicon via (TSV) process development |
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| Nikon outlines litho plan
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2010-03-02 |
| Nikon outlined its lithography roadmap that includes a revised roadmap for extreme ultraviolet (EUV) lithography |
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| Intel plans inverse litho due to EUV delay
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2007-06-25 |
| With the possible delay of its extreme ultraviolet lithography, Intel disclosed that it is developing a DFM technology that could extend optical scanners to the 22nm node |
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| TSMC reveals litho roadmap at SPIE conference
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2009-03-03 |
| TSMC has disclosed its lithography roadmap at the SPIE Advanced Lithography conference, saying it is still backing maskless technology |
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| Analyst: ASML, Nikon to share 22nm litho biz
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2010-03-23 |
| At 22nm, Intel will continue to use 193nm immersion lithography from two suppliers as per Arete Research analyst Jagadish Iyer |
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| CEA-Leti welcomes ST to e-beam litho programme
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2010-01-21 |
| The programme allows companies to assess a maskless lithography infrastructure for IC manufacturing and the use of Mapper Technology for high-throughput |
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| Intel takes 193nm litho to 15nm
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2009-06-23 |
| Intel claims that it has pushed 193nm immersion lithography down to 15nm—at least in the lab |
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| Photoresist market gets boost from litho tools
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2009-04-28 |
| The trend towards advanced 193nm DUV lithography tools is affecting the market shares of photoresist suppliers |
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| Canon keeps mum on litho nanoimprint
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2010-03-18 |
| An analyst believes that Canon's 'great white hope' in lithography rests with an undisclosed relationship with nanoimprint lithography vendor Molecular Imprints Inc |
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| ASML pushes EUV litho for 2012
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2009-10-12 |
| ASML offered a rough road map for extreme ultraviolet (EUV) lithography systems that could be ready for commercial use in late 2012 |
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| Toshiba, AIST team to up accuracy of optical litho
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2010-02-24 |
| Toshiba and the AIST have partnered to jointly develop a mask pattern optimising technology that improves the accuracy of lithography for LSIs by approximately 20 per cent |
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| Litho woes pulling down semicon industry
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2007-04-16 |
| The lithography world has suddenly turned upside-down as the industry gets socked by a double whammy: The window of opportunity is slowly closing on EUV lithography for IC production, but the most likely alternative—a version of 193nm immersion—is proving expensive |
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| Nikon vows comeback with double-patterning
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2009-12-15 |
| Nikon Corp. plans to regain share in the lithography market with in the upcoming double-patterning era |
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| Sun critiques NAND flash industry
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2009-08-18 |
| Sun Microsystems Inc. Michael Cornwell technologist scolded the NAND flash industry, saying vendors are ignoring the needs of the enterprise and moving towards the "lithography death march |
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| ASML, Nikon tie in litho equipment market
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2005-12-14 |
| For 2005, preliminary data indicates that ASML of the Netherlands will retain the lead in revenues with a 53.2 per cent share of the Rs.2,20,08 crores ($4.8 billion) market for new lithography tools, up from a 50.3 per cent share in 2004, according to The Information Network |
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| EUV delay makes alternatives a reality
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2010-03-01 |
| EUV lithography is delayed again and is now targeted for chip production at the 16nm half-pitch node, leaving the industry to face the dreaded double-patterning or some variation of the technology |
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| Sematech shows progress on EUV at 22 nm
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2008-08-14 |
| Sematech demo a way of using EUV lithography to define silicon devices with a half-pitch resolution of 22 nm |
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| IBM, Toppan focus on ArF immersion litho for 14nm
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2011-01-20 |
| IBM and Toppan Printing Co. Ltd of Japan will focus their joint development efforts on ArF immersion lithography for the 14nm logic technology node |
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