| MIT: Optical lithography to extend to 12nm
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2008-07-24 |
| MIT researches have so far demonstrated 25nm lines using a new technique called scanning beam interference lithography |
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| Lithography market reveals strong growth
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2007-01-31 |
| The lithography market reached a new record in 2006 with sales of Rs.30,364.40 crore ($6.7 billion), breaking its last record, according to The Information Network. According to the analyst, the lithography market will grow 11 per cent in 2007 to Rs.33,536.80 crore ($7.4 billion |
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| EUV lithography makes slow progress, reports Intel
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2006-11-20 |
| An Intel Corp. technologist has disclosed that EUV lithography is making little progress, prompting the firm to look at the deployment of immersion technology at its 32nm node |
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| IBM, Intel explore block co-polymer lithography
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2008-09-30 |
| IBM and Intel are exploring a new technology called co-polymer lithography in an effort to extend Moore's Law |
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| Immersion lithography 'nearly ready
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2006-02-24 |
| Taiwan Semiconductor Manufacturing Co. Ltd has said that immersion lithography is "nearly production ready |
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| IBM extends immersion lithography to 22nm
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2007-02-27 |
| IBM outlined last week its lithography roadmap, saying that it would extend 193nm immersion lithography down to the 22nm node for logic production. the company's plans for extreme ultraviolet (EUV) lithography could get pushed out again, as the technology is not expected to be ready for the early development work at the 22nm node for logic, according to IBM's lithography guru |
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| IBM breaks 193nm lithography record
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2006-02-22 |
| At the SPIE Microlithography Conference, IBM said that it has created the world's smallest line patterns using 193nm optical lithography |
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| Lithography research stalls at 32nm
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2006-08-10 |
| While immersion lithography has given the chip industry a short reprieve to scale to Moore's Law, lithographers are counting on either extreme ultraviolet or 193nm immersion scanners with higher-index fluids for the 32nm half-pitch |
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| ASML bags 45nm lithography deal
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2006-12-14 |
| IBM Corp. and Advanced Micro Devices Inc. (AMD) presented papers describing the use of immersion lithography, ultra-low-k dielectrics, and multiple enhanced transistor strain techniques for 45nm microprocessor designs at the International Electron Devices Meeting |
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| Uncertainty clouds advanced lithography
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2010-07-21 |
| Industry players present in Semicon West's session on advanced lithography remained sceptical despite brave pronouncements by vendors and users on what the future holds as complexities and costs increase |
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| Sematech to host lithography forum
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2008-03-18 |
| The Sematech consortium is planning to host a three-day lithography forum May 12-14 to try and elicit views and build consensus on the most realistic approach to next-generation lithography technology |
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| Electronics giant acquires ASML's patented lithography tech
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2005-09-22 |
| Toshiba Corp. has purchased a license for ASML Holding NV (ASML)'s patented lithography technology |
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| Evanescent wave lithography to emerge at SPIE
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2006-02-14 |
| Is a technology called EWL the next big thing in IC manufacturing? It's unclear, but RIT claims to have printed 26nm images based on EWL. |
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| EUV lithography most likely for 22-nm node
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2008-10-22 |
| EUVL is the most likely way the industry will make ICs with minimum geometries of 22-nm and finer. |
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| Project aims at 32nm mask lithography
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2008-09-09 |
| A joint R&D project will develop technologies and measurement processes for next-generation chip production. |
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