IBM breaks 193nm lithography record
Keywords: 193nm optical lithography IBM Mark LaPedus
[Summary of tips] At the SPIE Microlithography Conference early this week, IBM Corp. said that it has created the world's smallest line patterns using 193nm optical lithography.Using 193nm immersion techniques, IBM claims to have made distinct and uniformly spaced ridges at only 29.9nm wide. This is less than one-third the size of the 90nm featu......|
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