IBM extends immersion lithography to 22nm
Keywords: lithography extreme ultraviolet immersion lithography dry lithography 193nm
[Summary of tips] IBM Corp. outlined last week its lithography roadmap, saying that it would extend 193nm immersion lithography down to the 22nm node for logic production. With the announcement, the company's plans for extreme ultraviolet (EUV) lithography could get pushed out again, as the technology is not expected to be ready for the early de......|
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