Manufacturing/Packaging 
Sematech to host lithography forum
Keywords: extreme ultraviolet lithography
[Summary of tips] The Sematech consortium is planning to host a three-day lithography forum May 12-14 because it is concerned about the growing uncertainty on the approach manufacturers and suppliers should take to transition from the 32nm to the 22nm half-pitch technology node.The sessions are being structured to try and elicit views and build ......Please login or register with us to view this article>>
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