MIT: Optical lithography to extend to 12nm
Keywords: optical lithography scanning beam interference interference lithography photoresist process
[Summary of tips] Optical lithography can be extended to 12nm, according to Massachusetts Institute of Technology researchers. The researchers have so far demonstrated 25nm lines using a new technique called scanning beam interference lithography."We are demonstrating 25nm features, but using our present technique we believe we can achieve even ......|
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