Project aims at 32nm mask lithography
Keywords: R&D project measurement processes chip production
[Summary of tips] In a joint R&D project, the Advanced Mask Technology Centre (AMTC), semiconductor equipment provider Vistec and the German metrology institute PTB will develop technologies and measurement processes for next-generation chip production.The project Critical Dimensions and Registration for 32nm (CDuR32) Mask Lithography is funded ......|
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