EUV lithography most likely for 22-nm node
Keywords: extreme ultraviolet lithography integrated circuits wafers reliable high-power
[Summary of tips] Kurt Ronse, director of the advanced lithography program at IMEC, has come down in favour of extreme ultraviolet lithography (EUVL) as the most likely way the semiconductor industry will make ICs with minimum geometries of 22-nm and finer.This is despite the fact that throughput of wafers on prototype machines is still running ......|
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