What lies ahead for semis?
Keywords: semiconductor IC-equipment EDA solar
[Summary of tips] 14. Litho bluesOptical lithography continues to scale. 193-nm immersion, with double-pattering, will be used for the 22-nm node. At the 2009 SPIE event, the backers of EUV will continue to say that the technology is making ''progress.'' But when will we see real progress for EUV? Not when ASML or Nikon ships a ''pre-production'......|
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