EUV photoresist developed for 20nm
Keywords: photoresist 20nm process EUV
[Summary of tips] Toshiba Corp. touts a photoresist suitable for use with extreme ultraviolet (EUV) lithography and proved its viability in the first 20nm generation process technology.The development will be discussed at the 22nd International Microprocesses and Nanotechnology Conference at the Sheraton Sapporo Hotel, Sapporo, Japan Nov. 19.Pol......|
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