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Visible light nanoscaling enhances photolithography

Posted: 11 Feb 2011  Print Version  Bookmark and Share Subscribe 

Keywords:multi-photon photoresists  Resolution Augmentation through Photo-Induced Deactivation  nanoscale resolution 

[Summary of tips] University of Maryland research team says that the use of multi-photon photoresists enabling visible light to achieve nanoscale resolution that is inversely dependent on exposure time will help take forward photolithography research on extremely short wavelengths of UV light."Most approaches to getting higher resolution with ph......
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